Abstract

Silicon photonics is a rapidly maturing platform for optical communication and sensing. As systems leveraging silicon photonics have grown in size and complexity, so too has the demand for high performance silicon photonics components. In order to meet these demands, we propose a hierarchical approach to design and optimization of silicon photonics components. Our approach applies simple physical analysis to choose an effective starting geometry for a two-step gradient-based shape optimization. This optimization employs carefully chosen geometrical constraints in order to consistently produce robust, high performance devices which satisfy practical fabrication constraints of deep UV lithography. In order to demonstrate the versatility of method, we optimize a 3 dB coupler which achieves better than 0.04 dB excess loss over the O-band, a four port 3-dB coupler which achieves better than 0.41 dB excess loss and near 50:50 splitting over the O-band, and a fabrication-tolerant waveguide crossing which achieves better than 0.075 dB insertion loss over the O-band even when subject to $\pm \text{10}$ % silicon thickness variations. These results pave the way for high efficiency silicon photonic component libraries.

Highlights

  • I N RECENT years, there has been a trend towards designing large-scale silicon photonic systems

  • We will introduce a hierarchical approach to design and optimization of nanophotonic devices that minimizes guesswork and which consistently yields high performance designs. This methodology involves developing a starting geometry based on simple physical analysis and applying a shape optimization process that strategically employs different geometric constraints in order to limit the likelihood of falling into undesirable local optima

  • The hierarchical approach to photonic design that we introduced in the previous section presents a promising strategy for designing silicon photonic components which demand a high level of performance

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Summary

INTRODUCTION

I N RECENT years, there has been a trend towards designing large-scale silicon photonic systems. We will introduce a hierarchical approach to design and optimization of nanophotonic devices that minimizes guesswork and which consistently yields high performance designs This methodology involves developing a starting geometry based on simple physical analysis and applying a shape optimization process that strategically employs different geometric constraints in order to limit the likelihood of falling into undesirable local optima. Using this methodology, we are able to design common silicon photonic components with record high efficiencies and which are broadband and tolerant to fabrication variations

OVERVIEW OF INVERSE DESIGN TOOLS
HIERARCHICAL DESIGN AND OPTIMIZATION
Physics-Defined Topology
Coarse Optimization
Refinement Optimization
APPLICATION TO SILICON PHOTONICS
Four Port 3-dB Coupler
Fabrication-Tolerant Waveguide Crossing
Findings
CONCLUSION
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