Abstract

2D RF noise models based on Langevin-type drift-diffusion (DD) and hydrodynamic (HD) models for Si and SiGe devices are presented, where all transport and noise parameters are generated by full-band Monte Carlo (MC) bulk simulations. The DD and HD model are validated by comparison with MC device simulations. It is shown that the usual approach based on the DD model in conjunction with the Einstein relation fails under nonequilibrium conditions. Considering the full-band structure a remarkably strong dependence of noise on crystal orientation is found.

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