Abstract
电子束蒸发制备HfO2/SiO2高反膜的1064 nm激光预处理效应
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https://doi.org/10.3788/cjl20093606.1545
Journal: Chinese Journal of Lasers | Publication Date: Jan 1, 2009 |
Citations: 3 |
电子束蒸发制备HfO2/SiO2高反膜的1064 nm激光预处理效应
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