Hexagonal surface structure during the first stages of niobium growth on sapphire (1120)

Abstract

A detailed reflection high-energy electron diffraction study of the first stages of the niobium growth on (1120)s sapphire is presented for several substrate temperatures. It is shown that the niobium film exhibits an hexagonal surface structure when the deposited thickness is smaller than a critical value, which, depending on the substrate temperature, varies between 5 and 15 A. For thicknesses larger than this critical thickness, the surface hexagonal structure relaxes to the (110) bcc niobium structure. The hexagonal surface structure is observed for high substrate temperatures (820-410oC) but does not appear when the substrate temperature is 270oC. The epitaxial relationships between the substrate, the surface hexagonal structure of niobium and the cubic niobium phase are presented.