Abstract
An array of photovoltaic infrared sensors with 12 μm cutoff wavelength has been fabricated for the first time in a narrow-gap semiconductor layer grown heteroepitaxially on Si. Heteroepitaxy is achieved using intermediate stacked epitaxial CaF2-SrF2-BaF2 buffer layers to overcome the large lattice as well as thermal expansion mismatch between narrow-gap Pb1−xSnxSe and Si. The IR sensors exhibit resistance-area products up to 0.3 Ω cm2 at 77 K. This corresponds to sensitivities which are above the 300 K background noise limit and only 2–5 times lower than those of state of the art Hg1−xCdxTe sensors on CdZnTe substrates with the same cutoff wavelengths.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
