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Abstract
Potassium niobate (KNbO3) thin films have been deposited on silicon (Si) and strontium titanate (SrTiO3) substrates by metalorganic chemical vapor deposition. Stoichiometric KNbO3 films were obtained by adjusting the partial pressure of precursors. The crystallinity was examined by x-ray diffraction and reflection high-energy electron diffraction. Single-crystal (010) KNbO3 films with smooth surface were heteroepitaxially grown on (110)SrTiO3 substrate at 850 °C.
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