Height-modulation of diffraction gratings by light-controlled capillary force lithography for structural coloring

Abstract

Diffraction gratings are ubiquitous in many optical applications such as sensors, filters, and optical security devices. Capillary force lithography, which utilizes the capillary rise of photopolymer into nanoscale cavities, is a simple and rapid method to construct diffraction gratings without necessitating expensive instruments or complex steps. With the help of spatial light modulators, such as the digital micromirror device, the height of the grating can also be spatially modulated, printing spatially height-modulated gratings. When white light normally impinges on the grating, the light propagates into the grating interferes with light that propagates into air. By varying the height of the grating, the optical path lengths of two lights can be varied, leading to different interference effects and structural coloring. Judicious design of the grating’s parameters and patterning process will even allow encoding of multiple images. In this work, by tuning the height of the grating through the light-controlled capillary force lithography, we demonstrate grating-based structural color printing. This technique is promising for producing the custom patterns for anti-counterfeiting, authentication, and cryptography.