Abstract

GaSb quantum dots (QDs) in a GaAs matrix are investigated with cross-sectional scanning tunneling microscopy (X-STM) and photoluminescence (PL). We observe that Al-rich capping materials prevent destabilization of the nanostructures during the capping stage of the molecular beam epitaxy (MBE) growth process and thus preserves the QD height. However, the strain induced by the absence of destabilization causes many structural defects to appear around the preserved QDs. These defects originate from misfit dislocations near the GaSb/GaAs interface and extend into the capping layer as stacking faults. The lack of a red shift in the QD PL suggests that the preserved dots do not contribute to the emission spectra. We suggest that a better control over the emission wavelength and an increase of the PL intensity is attainable by growing smaller QDs with an Al-rich overgrowth.

Highlights

  • It was demonstrated recently that a significant number of GaSb nanostructures grown on GaAs disintegrate under the influence of high local strain fields and Sb segregation in the growth direction during capping with GaAs.[1,2,3,4,5]

  • It was shown that the hole localization energy for GaSb/GaAs quantum dot (QD) is increased when Al-rich capping material is used compared to pure GaAs.[14]

  • We present a crosssectional scanning tunneling microscopy (X-STM) and photoluminescence (PL) study on GaSb QDs in a GaAs matrix grown by molecular beam epitaxy (MBE), overgrown with Al-containing III-V

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Summary

Introduction

It was demonstrated recently that a significant number of GaSb nanostructures grown on GaAs disintegrate under the influence of high local strain fields and Sb segregation in the growth direction during capping with GaAs.[1,2,3,4,5] That is, the strain induced by capping causes lateral out-diffusion of Sb from the quantum dot (QD) core.[6]. Height stabilization of GaSb/GaAs quantum dots by Al-rich capping

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