Abstract
Hard boron suboxide thin films were deposited in an electron cyclotron resonance (ECR) microwave plasma system at substrate temperatures below 300 °C. A high-temperature effusion cell, operated at 2200°–2250 °C, was used for injection of boron downstream of an Ar/O2 ECR plasma. B ion bombardment is estimated to have been up to 6% of the total boron flux, and Ar ion bombardment is estimated to have contributed ∼100 eV/deposited atom. Boron suboxide films with oxygen concentrations of 11% exhibited hardnesses up to 30 GPa, equal to sapphire and near that of pure boron. The hardness/modulus ratio was 0.1, significantly better than that of sapphire (0.067) or solid boron (0.074), indicating these films may be of interest for a variety of tribological applications.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
