Abstract
Mass selected Ag n clusters ( n = 1,7,19) from a secondary ion source have been deposited onto a Pt(111) substrate at low temperature. The surface and resulting cluster morphology have subsequently been characterized within the same UHV chamber by variable temperature STM as a function of cluster size, kinetic impact energy, and substrate temperature. The kinetic energy per cluster atom was found to be the decisive parameter for a controlled deposition. Noble gas buffer layer (≈ 10 ML Ar), which were pre-adsorbed onto the surface at low temperatures, were found to efficiently dissipate the impact energy opening up the possibility of soft landing clusters with elevated kinetic energy.
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