Abstract
An investigation of the structural arrangement and mechanical properties of a-C:F:H films obtained by plasma enhanced chemical vapor deposition (PECVD) using C 2H 2–CF 4 gas mixtures as precursor atmospheres was carried out. The results indicate that fluorine incorporation increases the hydrophobicity of the films and relaxes the internal stress, while reducing the hardness also. It was shown that it is possible to obtain fluorinated carbon films with hydrophobicity comparable to that of polytetrafluoroethylene (TFE) but with much higher hardness, that is in the range of a few GPa.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
