Hafnium Silicate Gate Insulators in Field Effect Sensors Used to Detect DNA Hybridization

Abstract

Field-effect sensors with hafnium silicate gate insulators were fabricated following standard CMOS processes and compatible post-processes. The floating gates were functionalized with glycidoxypropyltrimethoxy silane and amine-terminated oligonucleotide probes. The pH sensitivity of the silicate surface decreased from 31.4 mV/pH to 24.6 mV/pH after functionalization due to passivation of a significant fraction of the amphoteric proton binding sites. A threshold voltage shift of 33 mV was observed as the buffer solution concentration changed from 0.015 M to 0.3 M after DNA probe molecule attachment. The hybridization caused a net increase in this shift of 3mV. With the help of a model which includes the solution of the Poisson-Boltzmann and proton site-binding at the gate, methods of achieving higher sensitivity are discussed.