Abstract
The corrosion behavior of aluminum alloys in the <TEX>$H_2SO_4$</TEX> solution was investigated based on potentiodynamic techniques. Electrochemical properties, such as corrosion potential(<TEX>$E_c$</TEX>), passive potential(<TEX>$E_p$</TEX>), corrosion current density(<TEX>$I_c$</TEX>), corrosion rate(mpy), of Al-Mg-Si, Al-Cu-Si and Al-Si alloys were characterized at room temperature. Passive aluminum oxide film, which including <TEX>$Al_2(SO_4)_3$</TEX> and <TEX>$3Al_2O_34SO_38H_2O$</TEX>, were uniformly formed on the surface via the reaction of Al with <TEX>$SO{_3}^{2-}$</TEX> or <TEX>$SO{_4}^{2-}$</TEX> ions in the <TEX>$H_2SO_4$</TEX> solution and the dependence of the corrosion behavior on the alloying element was discussed. The selective leaching of alloy element increased with increasing Cu content in the aluminum alloys.
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