Abstract
Bioinspired from structural coloration of butterfly wing structure, this work aims to fabricate nanoporous chitosan for UVC reflection. By taking advantage of self-assembled polystyrene-b-polydimethylsiloxane (PS-b-PDMS) with double gyroid texture followed by hydrofluoric acid etching of PDMS block, nanoporous PS with well-defined nanochannels can be fabricated, and used as a template for templated crosslinking reaction of chitosan through a multiple pore-filling process. Well-ordered nanoporous chitosan with shifting networks in nanoscale can be successfully fabricated after removal of the PS template. With the low absorption of chitosan in the ultraviolet region and the shifting networks for opening the bandgap, it is appealing to exploit the nanonetwork chitosan as high reflective materials for UVC optical devices, as evidenced by finite-difference time-domain (FDTD) simulation and optical measurements experimentally.
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