Growth of Vertically Aligned Carbon Nanotubes Depending on Thickness of Catalyst Films by Plasma-Enhanced Chemical Vapor Deposition

Abstract

We attempted to control the diameter and density of vertically aligned carbon nanotubes (VACNTs) using plasma-enhanced chemical vapor deposition. The VACNT diameter was reduced by decreasing the Ni catalyst thickness. Introducing the Mo layer between Ni catalyst and quartz substrate was effective for thin VACNT growth from the thin Ni catalyst film. This result demonstrated that the metal films had to be highly electric-conductive for inducing plasma on the Ni catalyst to grow VACNTs. The maximum density of VACNTs was obtained through the use of optimum plasma pretreatment time.