Growth of vertical graphene materials by an inductively coupled plasma with solid-state carbon sources

Abstract

A novel plasma assisted thin-film growth method of the free-standing few-layer graphene-based hierarchy complex material (aka. Growth of vertical graphene thereafter for simplicity) is presented in this article. Conventional solid-state carbon materials, i.e. commodity flexible graphite papers, is developed as a precursor feedstock for the growth of vertical graphene, in contrast to the prevailing wit of adopting hydrocarbon and hydrogen gases as precursor feedstocks. In the novel method, carbon radicals, the building blocks of vertical graphene are remotely knocked out from the graphite paper by a low-pressure argon-gas radio frequency inductively coupled plasma (RF ICP) without H2 gas steaming, and energetically condense on a variety of substrate materials. Real-time optical emission spectra analysis indicates that C2 species is the primary radicals contributing to the self-organized growth of vertical graphene. This research demonstrates an easier, safer and more economical approach to mass produce VG, compared to using hydrocarbon and hydrogen gases as a precursor.