Growth of vertical graphene by plasma-enhanced chemical vapor deposition and its applications

Abstract

As one of the most abundant elements on earth, carbon has a profound influence on human development. Currently, various carbon materials, especially graphene and carbon nanotube, have attracted our intensive attention. In particular, graphene, on which sp2-hybridized carbon atoms compose one layer, is widely applied for its distinctive structure and features. Yet, the structure of a material determines its properties. As an unusual graphene material with a unique structure, vertical graphene (VG) grown with plasma enhanced chemical vapor deposition (PECVD) reveals an exposed sharp edge, perpendicular-to-substrate orientation, non-stacking morphology, and great surface-to-volume ratio. These characteristics highlight the prospect of VG as an attractive material with extensive usage. This paper focuses on the preparation of VG, including the growth mechanism and factors affecting the growth process, then introduces some typical applications related to the property of VG. Finally, we will briefly summarize the structure, properties, and applications of VG.