Abstract
Niobium oxide films have been grown by reactive rf sputtering in a vacuum system and characterized by absorption spectroscopy and X-ray diffraction. The thickness of the (optically transparent) films has been determined as a function of sputtering time by examining interference effects in a plane-parallel layer. The average deposition rate is determined to be 7.4 ± 0.3 A/min (95% confidence interval).
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