Abstract
The kinetics in thermal laser-assisted chemical vapour deposition (LCVD) of titanium carbide (TiC) films and the influence of growth conditions on the structure and morphology of the deposits have been investigated. TiC spots were deposited onto silica substrates using a CW TEM00 CO2 laser beam. The reaction gas mixture consisted of TiCl4, CH4 and H2 and the ratios of the partial pressures of the reactants were varied. The films were analysed by X-ray diffractometry (XRD), micro-Raman spectroscopy, scanning electron microscopy (SEM) and profilometry.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.