Growth of thin, crystalline oxide, nitride and oxynitride films on metal and metal alloy surfaces

Abstract

This paper reviews the current knowledge of the properties of ultrathin, well-ordered oxide, nitride and oxynitride films grown on metal and metal alloy surfaces. Different modes of preparation are discussed and the vibrational and structural properties are summarized. The focus will be put onto Al-oxides grown on surfaces of the intermetallic alloys NiAl, Ni 3Al and FeAl. The properties of Ga 2O 3 grown on surfaces of the intermetallic alloy CoGa are also described. In these cases Al- and Ga-atoms, respectively, segregate from the substrate and react with adsorbed oxygen. The grown Al- and Ga-oxide films, respectively, order at elevated temperatures. Systems are also discussed where Al-oxide is grown by oxidation of Al-atoms which are evaporated on surfaces of the transition metals Re and Ru. The growth of transition metal oxides CoO (1 1 1)/Co (0 0 0 1), CoO (1 0 0)/Co (1 1 2 0), NiO (1 0 0)/Ni (1 0 0), NiO/Ni (1 1 1) and Cr 2O 3/Cr (1 1 0) are also presented. Thin films of Al- and Ga-nitride, respectively, can be grown on the base of the intermetallic alloy NiAl and CoGa by low-temperature adsorption of ammonia. These nitride films order at elevated temperatures. Al- and Ga-oxynitride, respectively, can be grown on surfaces of NiAl and CoGa substrates by adsorption on nitric oxide. An ordering of these ultrathin oxynitride layers is observed at elevated temperatures.