Abstract
Abstract We reported the results of an investigation into the preparation of amorphous Bi2O3 onto borosilicate glass substrate by means of atmospheric pressure halide chemical vapor deposition using BiI3 and oxygen as a source materials. Obtained thin films lower than 475 °C was amorphous and it was almost transparent in infrared region. But the amorphous films are iodine-containing Bi2O3, as results of analysis by XRD and XPS.
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