Abstract
The single crystal silver thin film was fabricated on NaCl single crystal substrate by low energy ion beam assisted deposition technology. It was found that the microstructure of the silver thin film was sensitive to the incident ion beam bombardment parameters. Among the various experimental conditions studied, the single crystal silver thin film was only obtained at impinging angle of 45°, ion beam energy of 500 eV and current density of 6 μA cm−2. The growth mechanism of the single crystal thin film was discussed based on channeling effects and lattice matching between silver films and the substrates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
