Abstract
Thin films of TiO2 on glass substrates were grown by the laser ablation technique using the second harmonic (532 nm) of a pulsed Nd–YAG laser as the evaporation source. During deposition, various substrate temperatures and oxygen pressures were used to optimise the growth of rutile TiO2 thin films. Raman spectroscopy and X-ray diffraction measurements showed that crystalline thin films were obtained at a substrate temperature as low as 100°C. The films show smooth surface morphology and good adhesion.
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