Abstract
Highly-ordered, single-domain (∼cm2), alumina nanopore arrays with controlled symmetry were obtained by anodizing prepatterned aluminum films that were deposited on silica substrates. Holographic lithography, in conjunction with a conformal deposition process, was utilized to form nanoscale corrugations on aluminum film surface prior to anodization. Both the order and symmetry of pore arrays were found to be well controlled and guided by the periodic surface corrugations from the initial stage of pore growth. Ordered nanopore arrays grown on foreign substrates are promising as a host or template for forming various nanodevices and their on-chip integration.
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