Abstract

Low-temperature fabrication of superior nano-/microcrystalline diamond (NCD/MCD) films is a major thrust in diamond technology. The widely used seeding techniques applied on the substrate surface are usually harsh, lead to defect formation, and suffer from the lack of reproducibility in maintaining homogeneity and uniformity over nano-/microdimensions. Low-temperature growth of a significant diamond phase on purely untreated glass substrates is indeed a challenging task. Using CO2 as the supplementary gas-phase constituent included in the (CH4 + H2)-plasma and a specific shadow-mask assembly to generate the diffuse plasma environment above the growth zone, the present experiment succeeds in the spontaneous growth of nanocrystalline diamond (NCD), including microcrystalline diamond (MCD) of an average crystal size of ∼0.9–1.2 μm at ∼300 °C on glass substrates, without any seeding pretreatment. In the plasma, the shadow mask establishes a virtual remote plasma configuration in setting the diffuse plasma, protects the growth surface from a direct bombardment of energetic ions, generates negative self-bias on the substrate, and, importantly, promotes significant gas-phase nucleation dominant over typical solid-state nucleation. The incubation of diamond embryo clusters onto the untreated glass substrates under the shadow-mask structure and its growth evolution through the efficient transport of the preferential carbonaceous precursors proceed within the diffuse plasma. In the course of network modification under the diffuse plasma, atomic O remains instrumental for efficient etching of the a-C overlayer on a diamond embryo and atomic H, with its small physical dimension, conveniently penetrates within the diamond network and promotes crystallization via transferring its moderate chemical energy to the diamond lattice. The low-temperature-grown nanostructured diamond films are up-and-coming for applications in nanotribology.

Full Text
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