Growth of MoS2 Thin Films Using the Two-step Approach

Abstract

In this study, MoS2 thin films were grown using two-step approach, which is based on employing both PVD and CVD techniques. The films were obtained initially by sputtering 1nm Mo film in the PVD system and followed by sulphurization of the film in CVD at 700 oC. The grown films were optimized employing different sulphurization times. The main difference in our study from the current literature is using preheated CVD furnace (700 oC) ahead of sulphurization. The films quality are then investigated using Raman and Photoluminance spectrometer as well as AFM measurements. The Raman spectrums indicate that two characteristic vibration modes of 2H-MoS2 phase were observed in all samples, however, vibration modes of 1T-MoS2 phase were also observed in some films at low sulphurization time. These results were also in line with PL measurements that confirm the direct band transition of the MoS2 films. The surface topography of the films were investigated by AFM for MoS2 films obtained by the sulfurization of 1 nm-thick Mo film in 15 minutes at 700 oC which shows MoS2 crystals in triangle shape