Abstract

We report the growth of molybdenum trioxide (MoO3) nanoribbons (NRs) on epitaxial Ag and oriented Au nanostructures (NSs) using an ultra-high vacuum (UHV)-molecular beam epitaxy (MBE) technique at different substrate temperatures. An approximately 2 nm silver (Ag) film has been deposited at different growth temperatures (using UHV-MBE) on cleaned Si(100), Si(110), and Si(111) substrates. For faceted Au NSs, an approximately 50 nm Au film has been deposited (using high-vacuum thermal evaporation) on a Si(100) substrate with a native oxide layer at the interface and the sample was annealed in low vacuum (≈10-2) and at high temperature (≈975°C). Scanning electron microscopy measurements were performed to determine the morphology of MoO3/Ag and MoO3/Au composite films. From energy dispersive X-ray spectroscopy elemental mapping and line scans it is found that faceted Au NSs are more favorable for the growth of MoO3 NRs than epitaxial Ag microstructures.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.