Growth of highly textured aluminum films on LiTaO 3 with optimized titanium intermediate layers

Abstract

Ultra thin titanium films in the range of a few nanometers have been deposited on monocrystalline lithiumtantalate (LiTaO 3) followed by deposition of 400 nm pure aluminum (Al). Texture measurements by means of electron backscatter diffraction show that the thickness of the intermediate titanium (Ti) layer significantly influences texture and grain structure of the overlying Al film. Increasing the thickness of the Ti layer from 0 nm to 20 nm leads to a change of aluminums texture from unoriented polycrystalline over highly oriented in single direction to highly oriented in twin structure.