Abstract
Adsorption of water on an ultra-thin alumina film grown epitaxially onto NiAl(1 1 0) has been investigated by temperature-programmed desorption, work function measurements, ultraviolet photoelectron spectroscopy, and high-resolution X-ray photoelectron spectroscopy as a function of surface coverage at 100 K. At low coverages monomeric H 2O species are adsorbed and it is proposed that the oxygen lone pair orbitals interact weakly via polarisation forces with the Al 3+ cations of the second layer. No indication for the dissociation of H 2O and the formation of OH − species has been found. For intermediate coverages clustering of H 2O molecules occurs and the growth of a three-dimensional ice layer is observed. Care has to be exercised in photoemission experiments of ice layers, since UV photon-induced dissociation of H 2O in thicker ice layers is indicated.
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