Abstract
Titanium nitride (TiN) thin films were grown epitaxially on Si (111) substrates by reactive pulsed laser deposition. Substrate temperatures ranged from 550 to 950 °C while plume kinetic energies ranged from 46 to 154 eV. Quality of the grown films depended strongly on kinetic energy of the films than the growth temperatures. High quality film was grown at 750 °C with a laser plume kinetic energy of ~ 92 eV. Full width at half maximum for a ω-scan around the TiN (111) peak and a φ-scan through the TiN (002) peak were 0.3° and 0.43 °, respectively. The resistivity of the films was increased with increased temperatures and a room temperature resistivity of 3.8 μΩ-cm was obtained.
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