Abstract
The mechanism and kinetics of electrochemical formation of anodic oxide films on iron-triad metal monosilicides in the 0.5 M H2SO4 solution in the potential range of 0.5 to 1.5 V (NHE) were studied by the methods of polarization and impedance measurements. It was concluded that the oxide films on the surface of studied silicides consisted predominantly of SiO2 and exhibited high barrier properties. The oxide film thickness and specific resistance in relation to the electrode potential were calculated from the impedance data. The constants of oxide film growth were determined.
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