Abstract
Amorphous Ti2O3 films with thicknesses ≳103 Å have been obtained by cw laser irradiation of Ti50Zr10Be40 exposed to low oxygen pressures. In contrast, thermal oxidation of (nonirradiated) samples reveals scales composed of crystalline oxides. Raman scattering, x-ray, and electron microscopy data on the layers are reported. It is suggested that irradiation leads to an enhanced oxidation rate preventing crystallization. Possible mechanisms of enhancement are discussed.
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