Abstract
The growth mode of MgCl2 on Au foil and Si (111) 7x7 reconstructed surface under UHV conditions, was investigated by X-ray Photoelectron Spectroscopy (XPS). Magnesium chloride grows with the Frank-van der Merve, (FM) growth mode on the Au foil. On Si surface there is evidence for the layer by layer growth of MgCl2 but leaving uncovered silicon areas at the first steps of deposition due to the Si (111)7x7 surface roughness.
Highlights
Magnesium Chloride is one of the most important magnesium compounds as far as industrial applications are concerned
The Au4f core level peak appears at 84.1eV binding energy (BE) and it is not shifted after MgCl2 deposition indicating no chemical interaction between the support and the deposit
The MgKLL auger photoelectron peak shifts 1.9eV to lower kinetic energy (KE) and the Cl2p core level peak shifts 0.63eV to higher BE after deposition of the maximum amount of MgCl2 on Au foil
Summary
Magnesium Chloride is one of the most important magnesium compounds as far as industrial applications are concerned. MgCl2 is used in Ziegler-Natta (ZN) catalyst preparation [1]. Supported on MgCl2 or on mixed MgCl2/SiO2 supports, Ziegler-Natta catalysts are used for the industrial olefin polymerization and the production of polymers, such as isotactic polypropylene or high density and linear low-density polyethylene. Magni and Somorjai [2] studied model Ti-based Ziegler-Natta catalysts prepared by MgCl2 sublimation under ultra high vacuum (UHV) conditions onto a gold foil. Surface sensitive spectroscopies comprise the most effective means of investigating the growth mode of MgCl2 on various substrates providing significant information of the surface composition and structure. The growth mode of MgCl2 on Au foil and Si (111) 7x7 is investigated by X-ray Photoelectron Spectroscopy (XPS). For the purposes of the present study, MgCl2 is applied on these supports by evaporation under UHV conditions
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