Abstract
AbstractA systematic study is undertaken on the effect of growth conditions, on the microstructure and other properties of radio frequency (RF) magnetron sputter deposited SrBi2Ta2O9 (SBT) and SrBi2TaNbO9 (SBTN) films. Polycrystalline SBT and SBTN films were deposited on Si (100), platinized Si, and MgO substrates using stoichiometric targets. Cross sectional scanning electron microscopy reveals the tendency for columnar growth in the films deposited at high substrate temperatures and at high partial pressures of sputtering gas mixtures. AFM studies show that the grain size and the homogeneous surface morphology depends on the post annealing time. XPS studies reveal that oxygen vacancies lie in the Bi2O2 planes. The compositional dependence of the rigid-sublattice mode and the symmetric stretching mode of oxygen octahedrons in the Raman spectra of these materials have been discussed.
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