Abstract
The vacuum thermal evaporation technique was used to simultaneously deposit zinc coatings onto interstitial free steel plates and single-crystal silicon wafers in a high vacuum environment. The effect of substrate temperature on the morphology and crystal orientation of zinc coatings was investigated. When the substrate temperature was 25 and 50 °C, the zinc crystallites were plate-like and grew under a particular angle to the substrate surface. After the substrate was heated to 100 °C, the zinc crystallites were regular hexagonal and arranged almost parallel to the substrate surface. In addition, observation of pure zinc coatings with different thicknesses showed that the growth of zinc coating was mainly in the Volmer–Weber mode. When the process parameters were appropriate, the zinc coating was composed of closely arranged columnar crystallites, and the crystallites grew preferentially along [0001] direction.
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