Abstract
The microstructure and the growth mechanism of the films, which were deposited on silicone oil surfaces by the rf-magnetron sputtering method, were studied systematically. It is found that, at the fixed incident rf capacity, the growth rate is not a constant and it depends on both the nominal film thickness and the substrate temperature. The film structure at the micrometer scale is highly sensitive to the substrate temperature. The dc resistance of the film increases with the increase of time, indicating that the behavior of the defects in the film is much different from that of the film deposited on a solid substrate. The effects of the liquid substrate are also discussed.
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