Abstract
The growth kinetics of polymer thin films prepared by plasma-based deposition method were explored using atomic force microscopy. The growth behavior of the first layer of the polythiophene somewhat differs from that of the other layers because the first layer is directly deposited on the substrate, whereas the other layers are deposited on the polymer itself. After the deposition of the first layer, each layer is formed with a cycle of 15 s. The present work represents the growth kinetics of the plasma-polymerized films and could be helpful for further studies on growth kinetics in other material systems as well as for applications of plasma-polymerized thin films.
Highlights
The growth kinetics of polymer thin films prepared by plasma-based deposition method were explored using atomic force microscopy
In the polymer thin films, Michelmore et al reported the early stage of the growth kinetics as island-like initial growth with subsequent continuous film growth[7]
Previous reports already show that atomic force microscopy (AFM) is an excellent tool for exploring growth kinetics of film deposition as well as phase transition, etc[5,8,9,10,11]
Summary
The growth kinetics of polymer thin films prepared by plasma-based deposition method were explored using atomic force microscopy. To prepare the polymer thin films, some attempts have been made using various deposition methods such as plasma sputtering, pulsed laser deposition, molecular beam epitaxy, and chemical vapor deposition[4]. Even though plasma-based deposition methods such as plasma-enhanced chemical vapor deposition, among the various deposition methods, have potential for further applications of the preparation of polymer thin films, growth kinetics has far not been clearly understood. Films grown by plasma-based deposition methods can be deposited on any type of substrate, regardless of shape[4]. Further application of the plasma-based deposition methods necessitates the understanding of growth kinetics in plasma-polymerized thin films. Previous reports already show that atomic force microscopy (AFM) is an excellent tool for exploring growth kinetics of film deposition as well as phase transition, etc[5,8,9,10,11]
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