Abstract
A route to engineer the intrinsic colossal magnetoresistance (CMR) response in manganite thin films through an accurate control of the growth kinetics is presented. It is shown that under specific growth conditions, a particular strained state, substantially different from that of bulk-like materials and standard films, can be quenched up to film thicknesses around 60 nm. This strained state exhibits the same structural fingerprints of the interfacial dead layer in standard films and promotes surface morphology instabilities, which end up with the formation of self-organized nanopits array. At the same time, it has profound effects on the intrinsic magnetoelectronic properties of the films that exhibit an enhanced intrinsic CMR response.
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