Growth Enhancement of Radish Seed Induced by Low-Temperature Argon Plasma

Abstract

The process of seed germination is described as the culmination of a series of events that start with wetting and end with the emergence of the embryo (typically the radicle) from the seed coat. This method has an impact on crop output and quality. The characteristics of the seed surface and the surroundings have an impact on the kinetics and volume of water absorption by seeds. As a result, modifying the characteristics of a seed's surface is a useful tactic for influencing seed germination. Low-temperature plasma (LTP) treatment of the seed for surface activation is now being researched as an effective pre-sowing technique. This study looked at the effects of LTP on radish (Raphanus sativus) seeds at room temperature for various times. The seed's germination properties, growth parameters, water contact angle (WCA), Scanning Electron Micrograph (SEM), and FTIR analysis were examined. WCA and SEM examination revealed a considerable alteration in the seed coat following LTP treatment, which is directly connected to water permeability into the seeds. Similarly, FTIR analysis confirmed that the enhancement of the hydrophilic properties of the seeds following plasma treatment is likely due to the damage of the hydrophobic moieties on the seeds' surface. The LTP treatment improved each germination-related parameter, including the vigor index, chlorophyll content, in-vitro radical scavenging activities, total flavonoid, and phenol in the seedlings. Our findings indicate that LTP treatment has a beneficial impact on early seed sprouting and the development of radish.