Growth, chemical composition, and structure of thin La x Hf1 − x O y films on Si

Abstract

The chemical structure, phase composition, and crystal structure of LaxHf1 − xOy films grown on Si using volatile metalorganic compounds as Hf and La precursors have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, energy dispersive X-ray microanalysis, and atomic force microscopy. By varying the lanthanum and hafnium source temperatures, we were able to grow films with 2 at % < CLa < 30 at %. The Hf 4f and La 3d peak positions in the XPS spectra of the films correspond to hafnium and lanthanum in the Hf4+ and La3+ states. With increasing La concentration, the reflections in the X-ray diffraction patterns of the films shift to smaller 2θ angles, indicating the formation of solid solutions. At 18 at % La, we observed a transition from a fluorite-like structure to the pyrochlore structure (La2Hf2O7). The film containing 30 at % La consisted of a mixture of c-La2O3 and La2Hf2O7. The surface roughness of the films was shown to increase with increasing La concentration. Capacitance-voltage (C-V) measurements were used to assess the relative permittivity (k) of the films as a function of La concentration. The minimum k value was obtained at the La concentration corresponding to the transition from the fluorite structure to an ordered pyrochlore structure (second-order phase transition).