Abstract
Low-pressure alcohol catalytic chemical vapor deposition (LP-ACCVD), which is an ACCVD method at a lower pressure (<1 Pa) than that in the conventional method, has been attracting much interest because it enables the low-temperature growth of single-wall carbon nanotubes (CNTs). However, the growth rate of CNTs by LP-ACCVD is markedly low owing to its low growth pressure. To alleviate this problem, we have examined the influence of the catalyst preparation and CVD conditions on the properties of CNTs grown by LP-ACCVD. It has been found that the oxidation of catalyst enhances the growth of CNTs by LP-ACCVD. Furthermore, the low flow rate of the ethanol enhances the growth yield of CNTs at lower growth temperature, which is understood to be the result of sufficient gas heating on the substrate.
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