Abstract
Pb(Zr, Ti)O3 (PZT) thin films were deposited on various Pt substrates using a Pb(Zr0.63, Ti0.37)O3 and a Pb target by rf magnetron sputtering. The preferred orientation of PZT films was significantly influenced by a structure of Pt electrode. (100)-oriented PZT films grew on Pt/Ti/SiO2/Si substrate while (ill) PZT films formed on TiOx/Pt/SiO2/Si substrate. TiOx/Pt/Ti/SiO2/Si substrate structure favored growth of a mixed orientation of (100) and (111) PZT films. The preferred orientation could be explained using concepts of lattice matching and minimization of surface energy. Ferroelectric and fatigue characteristics were also investigated and their relationship with microstructure and electrode structure were discussed.
Published Version
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