Abstract
We report a method for the fabrication of high structural quality CrN nanoislands on Cu(001). The CrN nanoislands can be fabricated in ultrahigh vacuum conditions by means of Cr atoms deposition on saturated Cu(001)c(2×2)-N surface and subsequent annealing at 500°C. Existence of two types of nanoislands is shown by scanning tunneling microscopy investigations with atomic resolution for different CrN nanoislands formed on surface with 0.35 monolayer Cr coverage. The measured in-plane lattice constant (a=0.39±0.01nm) of the CrN nanoislands is 8% larger than the Cu substrate lattice. X-ray photoemission spectroscopy investigations reveal chromium nitride phase transition from CrN to Cr2N associated with changes of Cr concentration.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
