Abstract
We report the epitaxial growth of ferroelectric (0.2)Bi(Zn1∕2Ti1∕2)O3–(0.8)PbTiO3 thin films. Despite its high c∕a ratio, the off-axis rf magnetron sputtering yields the epitaxial growth of high-quality thin films on (001) SrTiO3 substrates. The structural development of the film with increasing film thickness has been examined by using the synchrotron x-ray diffraction and x-ray reflectivity. The experimental results can be explained in terms of the strain relaxation process associated with the misfit dislocations between the thin film and the substrate.
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