Growth and properties of hard coatings prepared by physical vapor deposition methods

Abstract

Physical vapor deposition (PVD) methods have found widespread application in the deposition of hard coatings. In order to compare potentials and limitations of the PVD methods, a good knowledge of the physical processes of film growth, formation of various film microstructures, and the resulting properties is necessary. Here the latest advances in understanding the effects of physical film growth parameters on the microstructure of growing films are reviewed. Examples of sputtered TiN film microstructures are given. A critical review of the structure zone models is presented. The importance of the homogeneity of both vapor and ion fluxes is also discussed and illustrated with examples. The problems of uniformity of both the film thickness and properties are also discussed. The requirements imposed on surface pretreatment are highlighted.