Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets

Abstract

Amorphous nitrides are explored for their homogeneous structure and potential use as wear-resistant coatings, beyond their much studied nano- and microcrystalline counterparts. (TiB2)1-xSixN thin films were deposited on Si(001) substrates by a hybrid technique of high power impulse magnetron sputtering (HIPIMS) combined with dc magnetron sputtering (DCMS) using TiB2 and Si targets in a N2/Ar atmosphere. By varying the sputtering dc power to the Si target from 200 to 2000W while keeping the average power to the TiB2-target, operated in HIPIMS mode, constant at 4000W, the Si content in the films increased gradually from x=0.01 to x=0.43. The influence of the Si content on the microstructure, phase constituents, and mechanical properties was systematically investigated. The results show that the microstructure of as-deposited (TiB2)1-xSixN films changes from nanocrystalline with 2–4nm TiN grains for x=0.01 to fully electron diffraction amorphous for x=0.22. With increasing Si content, the hardness of the films increases from 8.5GPa with x=0.01 to 17.2GPa with x=0.43.