Abstract
AbstractStrontium-titanate-oxide (STO) thin films have been deposited on silicon substrates by means of a reactive pulsed-laser-deposition technique. The influence of the oxygen deposition pressure on the microstructural properties of the films has been investigated by means of various characterization techniques. It was found that the crystalline quality of the film significantly deteriorates as the oxygen pressure increases. This is accompanied by an increase of the film microporosity. The microstructure of the film is found to directly impact the optical quality of the films. In particular, due to the higher density and crystallinity of the films deposited at lower oxygen pressure, films characterized by lower optical losses can be achieved in such conditions. These films have been used in the context of the development of optical waveguides. For this purpose, patterning of the STO films was investigated using sputter-etching with a high-density argon plasma operated in the very low pressure regime. Highly anisotropic features have been produced with high etch rate and good selectivity over resist. Preliminary results indicate the STO films can be successfully incorporated in functional waveguides.
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