Abstract
Diamond-like carbon (DLC) films were deposited on aluminum substrate using vacuum arc deposition (VAD) and plasma immersion ion implantation – deposition (PIII-D). Even though Raman and XPS results show that the carbon films deposited by VAD and PIII-D both possess DLC structures, atomic force microscopy (AFM) reveals that the two sets of films have very different surface morphologies. The growth mechanisms in these two techniques thus differ and the different nucleation and growth mechanisms of the DLC films deposited by VAD and PIII-D can be explained using the statistical formation theory. Growth models for VAD and PIII-D DLC films are proposed.
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