Abstract
Coiled carbon nanostructure (CNS) is prepared by a catalytic chemical vapor deposition (CVD) process on copper/chromium films deposited by radio frequency (RF) sputtering. Uniform CNS with coiled structure is fabricated by changing the size of the catalyst particles. The effects of Cu catalyst size and RF sputtering power, on the growth of the coiled CNS are discussed, and the results importantly conclude that Cu-catalyzed CVD offers a preferable control of coiled CNS to optimize the field emission property for application.
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