Abstract
A unique microwave plasma chemical vapor deposition (MPCVD) technique was employed to produce multiply twinned diamond films with quintuplet wedges. Biased nucleation, nonbiased growth, and high methane/hydrogen ratio (≳5%) were used to prepare the multiply twinned diamond films. The growth parameter α was carefully controlled to be close but larger than 3/2 to allow the multiply twinned particles with quintuplets to outgrow the parent face to form the secondary crystals with uniformly distributed particle sizes and smooth surface. Since there is no need to suppress the natural growth of twins in vapor-grown diamond, higher growth rate was achieved. Excellent field emission properties of such films compared to the normal MPCVD diamond films were also obtained.
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